Analysis of problem in mathematical model for shadowed sputtering
A mathematical model for shadowed sputtering is given. In frame of a given model there exist three problems: a straight problem of predicting Y using given A and X; an auxiliary inverse problem of restoring X using experimentally given A and Y; and a main inverse problem of synthesis the shadowing mask parameters and a mask function A using restored X and prescribed Y. Properties of integral operator of these problems let solving in a stable manner both inverse problems. Besides the methods of their solving and their properties make it possible to approach a predicted function of a sputtered layer with any given accuracy.