The formation of Ti-O tetrahedra and band gap reduction in SiO₂ via pulsed ion implantation

Green R.J. ¹ , Hunt A. ¹ , Moewes A. ¹ , Zatsepin D.A.^{2, 3} , Kurmaev E.Z.² , Gavrilov N.V. ⁴

Journal of Applied Physics

10

Английский

103704

Опубликовано

113

2013

• ¹ Department of Physics and Engineering Physics|University of Saskatchewan
• ² Institute of Metal Physics|Russian Academy of Sciences|Ural Division
• ³ Ural Federal University
• ⁴ Institute of Electrophysics|Russian Academy of Sciences|Ural Division