Selective response of mesoporous silicon to adsorbants with nitro groups

Authors
McLeod J.A. 1 , Boyko T.D. 1 , Moewes A. 1 , Kurmaev E.Z.2 , Sushko P.V.3, 4 , Levitsky I.A.5, 6
Publisher
Wiley-VCH Verlag
Number of issue
10
Language
English
Pages
2912-2922
Status
Published
Volume
18
Year
2012
Organizations
  • 1 Department of Physics and Engineering Physics|University of Saskatchewan
  • 2 Institute of Metal Physics|Russian Academy of Sciences|Ural Division
  • 3 Department of Physics and Astronomy|London Centre for Nanotechnology|University College London
  • 4 WPI-Advanced Institute for Materials Research|Tohoku University
  • 5 Emitech, Inc.
  • 6 Department of Chemistry|University of Rhode Island
Date of creation
08.07.2024
Date of change
08.07.2024
Short link
https://repository.rudn.ru/en/records/article/record/128398/
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