Interfacial properties and characterization of Sc/Si multilayers

Authors

Shendruk T.N. ¹ , Moewes A. ¹ , Kurmaev E.Z. ² , Ochin P. ³ , Maury H. ^4, ⁵ , André J.M. ^4, ⁵ , Le Guen K. ^4, ⁵ , Jonnard P. ^4, ⁵

Journal

Issue number

Language

English

Pages

3808-3812

State

Published

Volume

518

Year

2010

Organizations

¹ Department of Physics and Engineering Physics|University of Saskatchewan
² Institute of Metal Physics|Russian Academy|Sciences-Ural Division
³ ICMPE Institut de Chimie et Matériaux Paris Est|CNRS-Université Paris XII UMR 7182
⁴ Laboratoire de Chimie Physique-Matiére et Rayonnement|UPMC Univ Paris 06
⁵ CNRS-UMR 7614

Cite

Article

Jin J., Zhang X.Y., Xu W., Zhou Y.X., Chang G.S., Moewes A., Boukhvalov D.W., Finkelstein L.D., Kurmaev E.Z.

Thin Solid Films. Vol. 518. 2010. P.. 2825-2829

Article

Jin J., Xu W., Zhou Y.X., Zhang X.Y., Chang G.S., Moewes A., Finkelstein L.D., Kurmaev E.Z., Boukhvalov D.W.

Solid State Communications. Vol. 150. 2010. P.. 1065-1068