Applied Physics Letters

Type

Journal

Publisher

American Institute of Physics

Codes

ISSN: 0003-6951, EISSN: 1077-3118

Date of creation

08.07.2024

Date of change

08.07.2024

Short link

https://repository.rudn.ru/en/recordsources/recordsource/16723/

List of records

Display:

PRESSURE-INDUCED CHANGES IN THE ELECTRON DENSITY DISTRIBUTION IN Α -GE NEAR THE Α-Β TRANSITION

Article

Li R., Liu J., Bai L., Shen G., Tse J.S.

Applied Physics Letters. American Institute of Physics. Vol. 107. 2015. 072109 p.

HIGH PRESSURE-LOW TEMPERATURE PHASE DIAGRAM OF BARIUM: SIMPLICITY VERSUS COMPLEXITY

Article

Desgreniers S., Tse J.S., Li Q., Ma Y., Matsuoka T., Ohishi Y.

Applied Physics Letters. American Institute of Physics. Vol. 107. 2015. 221908 p.

PRESSURE INDUCED SPIN TRANSITION REVEALED BY IRON M2,3-EDGE SPECTROSCOPY

Article

Nyrow A., Büning T., Mende K., Tolan M., Sternemann C., Tse J.S., Hiraoka N., Desgreniers S., Wilke M.

Applied Physics Letters. American Institute of Physics. Vol. 104. 2014. 262408 p.

THE ORIGIN OF THE RESISTANCE CHANGE IN GESBTE FILMS

Article

Jang M.H., Cho M.H., Park S.J., Kurmaev E.Z., Finkelstein L.D., Chang G.S.

Applied Physics Letters. American Institute of Physics. Vol. 97. 2010. P. 152113-3

ELECTRONIC STRUCTURE OF A POTENTIAL OPTICAL CRYSTAL Y BA3 B9 O18: EXPERIMENT AND THEORY

Article

Zhang Z.H., He M., Wang X.F., Li Q., Yang J.

Applied Physics Letters. American Institute of Physics. Vol. 92. 2008. 171903 p.

BUFFER LAYER EFFECT ON THE STRUCTURAL AND ELECTRICAL PROPERTIES OF RUBRENE-BASED ORGANIC THIN-FILM TRANSISTORS

Article

Seo J.H., Park D.S., Cho S.W., Kim C.Y., Jang W.C., Whang C.N., Yoo K.-H., Chang G.S., Pedersen T., Moewes A., Chae K.H., Cho S.J.

Applied Physics Letters. American Institute of Physics. Vol. 89. 2006.

ANALYSIS OF OCTADECYLTRICHLOROSILANE TREATMENT OF ORGANIC THIN-FILM TRANSISTORS USING SOFT X-RAY FLUORESCENCE SPECTROSCOPY

Article

Kang S.J., Yi Y., Kim C.Y., Whang C.N., Callcott T.A., Krochak K., Moewes A., Chang G.S.

Applied Physics Letters. American Institute of Physics. Vol. 86. 2005. P. 1-3

COMPTON SCATTERING OF ELEMENTAL SILICON AT HIGH PRESSURE

Article

Tse J.S., Klug D.D., Jiang D.T., Sternemann C., Volmer M., Huotari S., Hiraoka N., Honkimäki V., Hämäläinen K.

Applied Physics Letters. American Institute of Physics. Vol. 87. 2005. P. 1-3

ANGULAR ROTATION OF MAGNETIC HYSTERESIS OF ION-IRRADIATED FERROMAGNETIC THIN FILMS

Article

Chang G.S., Callcott T.A., Zhang G.P., Woods G.T., Kim S.H., Shin S.W., Jeong K., Whang C.N., Moewes A.

Applied Physics Letters. American Institute of Physics. Vol. 81. 2002. P. 3016-3018

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Other record sources

CHEMPHYSCHEM

Journal

Wiley Interscience.

FERROELECTRICS

Conference proceedings

Gordon and Breach Science Publishers. 2004.