Chen C., Lan T., Xiao C., Zhuang G., Zhang S., Ding W., Wu Z., Mao W., Wu J., Xu H., Zu Y., Zhang D., Wei Z., Wen X., Zhou C., Liu A., Xie J., Li H., Liu W., Kong D.
Plasma Science and Technology.
Institute of Plasma Physics.
Vol. 24.
2022.
045102 p.