The formation of Ti-O tetrahedra and band gap reduction in SiO2 via pulsed ion implantation

Authors
Green R.J. 1 , Hunt A. 1 , Moewes A. 1 , Zatsepin D.A.2, 3 , Kurmaev E.Z.2 , Gavrilov N.V. 4
Number of issue
10
Language
English
Pages
103704
Status
Published
Volume
113
Year
2013
Organizations
  • 1 Department of Physics and Engineering Physics|University of Saskatchewan
  • 2 Institute of Metal Physics|Russian Academy of Sciences|Ural Division
  • 3 Ural Federal University
  • 4 Institute of Electrophysics|Russian Academy of Sciences|Ural Division
Date of creation
09.07.2024
Date of change
09.07.2024
Short link
https://repository.rudn.ru/en/records/article/record/135867/
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