The formation of Ti-O tetrahedra and band gap reduction in SiO2 via pulsed ion implantation

Authors

Green R.J. ¹ , Hunt A. ¹ , Moewes A. ¹ , Zatsepin D.A.^2, ³ , Kurmaev E.Z.² , Gavrilov N.V. ⁴

Journal

Number of issue

Language

English

Pages

103704

Status

Published

Volume

113

Year

2013

Organizations

Cite

ГОСТ MLA RIS BibTex

Article

Kovalchukova O.V., Do Nguyen D., Strashnova S.B., Stash A.I., Bel'Skii V.K.

Russian Journal of Coordination Chemistry/Koordinatsionnaya Khimiya. Vol. 39. 2013. P. 234-238

Article

Kovalchukova O.V., Strashnova S.B., Churakov A.V., Sergienko V.S., Abbas A.T.R.A., Kuznetsov D.N., Kobrakov K.I.

Russian Journal of Inorganic Chemistry. IAPC Nauka/Interperiodica. Vol. 58. 2013. P. 395-399

The formation of Ti-O tetrahedra and band gap reduction in SiO₂ via pulsed ion implantation