Compton scattering of elemental silicon at high pressure

Authors
Tse J.S. 1 , Klug D.D.2 , Jiang D.T.3 , Sternemann C.4 , Volmer M.4 , Huotari S.5 , Hiraoka N.5 , Honkimäki V.5 , Hämäläinen K.6
Publisher
American Institute of Physics
Number of issue
19
Language
English
Pages
1-3
Status
Published
Volume
87
Year
2005
Organizations
  • 1 Department of Physics and Engineering Physics|University of Saskatchewan
  • 2 Steacie Institute for Molecular Sciences|National Research Council of Canada
  • 3 Canadian Light Source, Incorporated|University of Saskatchewan
  • 4 Institute of Physics|DELTA|University of Dortmund
  • 5 European Synchrotron Radiation Facility
  • 6 Division of X-ray Physics|Department of Physical Sciences|University of Helsinki
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Other records

Mibe T., Nakano T., Ahn D.S., Ejiri H., Fujiwara M., Hotta T., Kino K., Kohri H., Matsumura T., Matsuoka N., Morita M., Muramatsu N., Shagin P.M., Zegers R.G.T., Sugaya Y., Sumihama M., Chang W.C., Oshuev D.S., Wang C.W., Wang S.C., Ahn J.K., Akimune H., Yonehara K., Asano Y., Daté S., Kumagai N., Ohashi Y., Ohkuma H., Toyokawa H., Yorita T., Fujimura H., Kim Z.Y., Titov A.I., Hicks K., Imai K., Ishikawa T., Miwa K., Miyabe M., Niiyama M., Sasaki T., Yosoi M., Iwata T., Kawai H., Ooba T., Shiino Y., Makino S., Matsuda T., Toi Y., Miyachi Y., Nomachi M., Sakaguchi A., Rangacharyulu C., Shimizu H., Wakai A., Yoshimura M.
Physical Review Letters. Vol. 95. 2005. P. 1-4