The origin of the resistance change in GeSbTe films

Authors
Jang M.H. 1 , Cho M.H. 1, 2 , Park S.J. 2 , Kurmaev E.Z. 3 , Finkelstein L.D. 3 , Chang G.S. 4
Journal
Applied Physics Letters
Publisher
American Institute of Physics
Issue number
15
Language
English
Pages
152113-3
State
Published
Volume
97
Year
2010
Organizations
  • 1 Atomic-scale Surface Science Research Institute|Yonsei University
  • 2 Institute of Physics and Applied Physics|Yonsei University
  • 3 Ural Division|Institute of Metal Physics|Russian Academy of Sciences
  • 4 Department of Physics and Engineering Physics|University of Saskatchewan
Cite
ГОСТ MLA RIS BibTex
Share

Other records