Cobalt is one of the most promising non-noble metal as electrocatalyst for water oxidation. Herein, a highly stable silicon-cobalt mixed oxide thin film with a porous columnar nanostructure is proposed as electrocatalyst for oxygen evolution reaction (OER). CoOx and CoxSiyOz layers with similar thickness were fabricated at room temperature by magnetron sputtering in a glancing angle configuration (MS-GLAD) on tin-doped indium oxide (ITO) substrates. After characterization, a comparative study of the electrocatalytic performance for OER of both layers was carried out. The excellent long-term stability as electrocatalyst for OER of the porous CoxSiyOz thin film demonstrates that the presence of silicon on the mixed oxide network increases the mechanical stability of the Si/Co layer, whilst maintaining a considerable electrocatalytic response.